Correlating aluminum layer deposition rates, Josephson junction microstructure, and superconducting qubits’ performance
An ultra-thin aluminum oxide layer is a key component for Josephson junctions in superconducting quantum bits. This layer serves as a barrier layer for Cooper pairs tunneling between the superconducting electrodes and significantly influences the overall performance of the junction. In this study, we investigate the impact of aluminum deposition rates on the microstructure and chemical variation of the aluminum oxide layer, as well as the device's yields and qubits’ lifetimes.
Learn More